Abstract:

The method for direct determination of the silicon content in industrial silicon with hydrofluoric acid weight method is described. Sample is decomposed with nitric acid and hydrofluoric acid to form silicon tetrafluoride for removal and then it is burned in a high temperature oven. According to the mass difference before and after treatment of hydrofluoric acid, the mass percentage of silicon is calculated by subtracting the increment of ferric oxide formed by iron oxidation. The relative deviation of the method is below 0.20%.